| BEAM SPLITTERS AND FILTER GLASS (DICHROIC GLASS) Dielectric beam splitters split the incident light into a transmission component and a reflection component. The ratio of transmission and reflection is always complementary and adapted to the customer’s wishes. Beam splitters consist of a sequence of high and low refractive dielectric materials, which are separated in a high vacuum using electron beam evaporation. To reduce interfering secondary reflections and mirror effects, the beam splitter’s output side has a wide-band anti-reflective coating. Beam splitter plates made by FLABEG are especially resistant to environmental effects, such as humidity, temperature fluctuations, and mechanical stress. A further strength of dielectric layer systems compared with metal splitter mirrors is their very low absorption, which means that the beam of light is divided into a reflection component and a transmission component virtually without loss. BEAM SPLITTERS  Our beam splitters and filter glass are used in a huge variety of different areas and applications, such as: • Video conference systems and teleprompters • Optical measuring instruments • Laser applications • Automobile displays We will be happy to adapt our beam splitters and/or filters to your needs. DICHROIC GLASS High-energy light sources can also have a damaging effect on tinted glass due to its heat-absorbing properties. Dichroic color filters have the advantage of reflecting unwanted incident light instead of absorbing the energy, which allows dichroic filters to be used in conjunction with much higher intensity light sources. Dichroic color filters are used in a whole variety of applications, such as in architecture, the entertainment industry, science, and engineering. Many industry-standard colors are available as dichroic filters. However, we would be happy to review any custom color coatings you desire for your project.
Technologies: Our thin-film technology produces excellent results that our competitors would be hard pressed to imitate: FLABEG uses Physical Vapor Deposition (PVD) processes. PVD is a group of high-vacuum coating processes that produce thin films in the range of several nanometers – primarily optically functional layers. FLABEG uses the following PVD processes: • Electron beam evaporation • Sputtering as well as reactive versions of these processes. Electron beam evaporation: With this coating process, a high-energy electron beam is used to evaporate granular coating material contained in crucibles. The evaporated material fans out in a vapor stream that is then deposited on the glass substrates above the crucibles. This condensation forms the film. With the aid of rotating, multiple-pocket crucibles that can be furnished with different coating materials, it is possible to deposit multiple layers in a single coating cycle. The coating structure can be controlled by selecting coating parameters and adjusting the substrate temperature. Precise in-situ control of the coating process (for example, deactivation of the electron gun when the requisite transmission value is reached) makes it possible to produce high-precision optically functional layers, such as beam splitters with different transmission and reflection values. FLABEG performs electron beam evaporation in batch mode. In addition to metals and oxides in a reactive atmosphere, fluorides and sulphides can also be evaporated. Sputtering: The magnetron sputtering process is based on a continuous argon gas discharge, known as plasma. Low-pressure plasma is ignited by a high voltage of up to 1000 V. The target material attached to the magnetron is evaporated by a beam of argon ions and deposited onto the glass surface in a thin, even, compact layer. In the case of non-reactive sputtering processes, such as the sputtering of metal films, the sputtered cathode material is deposited directly onto the glass surface. With reactive sputtering, oxides or nitrides react with reactive gases before being deposited on the glass surface. Dual magnetrons improve efficiency The state-of-the-art vacuum coating system performs both reactive and non-reactive sputtering in a single coating process. Dual magnetrons can be used for the efficient and economical production of highly insulating, highly resistant silicon oxide films that serve as a basic material for optically functional layers – such as anti-reflective systems – while also meeting the highest quality standards. |
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